Tunable surface hardness and dielectric constant of SiC x O y thin film converted from solution-processed organosilicon compound-Reference-Cited by-同舟云学术

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Tunable surface hardness and dielectric constant of SiC x O y thin film converted from solution-processed organosilicon compound

Published:2012-02-24 Issue:11 Volume:47 Page:4540-4545
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Lee Pyoung-Chan,Kim Sieun,Hwang Taeseon,Oh Joon-Suk,Oh Yong-Soo,Pu Lyongsun,Kim Byung-Woo,Lee Youngkwan,Choi Hyouk Ryeol,Jeoung Sun Kyoung,Nam Jae-Do

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/s10853-012-6312-7.pdf

Reference29 articles.

1. Jin H-Y, Ishiyama M, Qiao G-J, Gao J-Q, Jin Z-H (2008) Mater Sci Eng A 483–484:270

2. Lopez AJ, Urena A, Lopez MD, Rams J (2008) Surf. Coat. Technol. 202:3755

3. Ma Y, Ma Q-S, Suo J, Chen Z-H (2008) Ceram. Int. 34:253

4. Maier G (2001) Prog Polym Sci 26:3

5. Schulz SE, Koerner H, Murray C, Streiter I, Gessner T (2001) Microelectron Eng 55:45

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