Effect of plasma treatment on the microstructure and electrical properties of MIM capacitors with PECVD silicon oxide and silicon nitride
Author:
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
http://link.springer.com/content/pdf/10.1007/s10853-006-0012-0.pdf
Reference11 articles.
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4. Chen CT, Chiou BS (2004) J Mater Sci Mater Electron 15:139
5. Van Huylenbroeck S, Decoutere S, Venegas R, Jenei S, Winderickx G (2002) IEEE Electron Device Lett 23:191
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