Influence of a silicon-bearing film on the early stage oxidation of pure titanium
Author:
Funder
National Science Foundation
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
http://link.springer.com/article/10.1007/s10853-017-1143-1/fulltext.html
Reference32 articles.
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2. Kofstad P, Anderson PB, Krudtaa OJ (1961) Oxidation of titanium in the temperature range 800–1200 °C. J Less Common Met 3:89–97. doi: 10.1016/0022-5088(61)90001-7
3. Stringer J (1960) The oxidation of titanium in oxygen at high temperatures. Acta Metall 8:758–766. doi: 10.1016/0001-6160(60)90170-X
4. Unnam J, Clark RK (1986) Oxidation of commercial purity titanium. Oxid Met 26:231–252. doi: 10.1007/Bf00659186
5. Bertrand G, Jarraya K, Chaix JM (1984) Morphology of oxide scales formed on titanium. Oxid Met 21:1–19. doi: 10.1007/Bf00659464
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