Effect of atomic layer deposited Al2O3 and subsequent annealing on the nanomechanical properties on various substrates
Author:
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
http://link.springer.com/content/pdf/10.1007/s10853-021-05804-6.pdf
Reference31 articles.
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2. Leskelä M, Ritala M (2003) Atomic layer deposition chemistry: recent developments and future challenges. Angew Chem Int Ed 42(45):5548–5554
3. Wen L, Zhou M, Wang C, Mi Y, Lei Y (2016) Nanoengineering energy conversion and storage devices via atomic layer deposition. Adv Energy Mater 6(23):1600468. https://doi.org/10.1002/aenm.201600468
4. Mayer TM, Elam JW, George SM, Kotula PG, Goeke RS (2003) Atomic-layer deposition of wear-resistant coatings for microelectromechanical devices. Appl Phys Lett 82(17):2883–2885
5. Budnitzki M, Pierron O (2009) The influence of nanoscale atomic-layer-deposited alumina coating on the fatigue behavior of polycrystalline silicon thin films. Appl Phys Lett 94(14):141906. https://doi.org/10.1063/1.3112565
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