Atomistic processes and the strain distribution in the early stages of thin film growth-Reference-Cited by-同舟云学术

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Atomistic processes and the strain distribution in the early stages of thin film growth

Published:2001-04 Issue:4 Volume:72 Page:443-446
ISSN:0947-8396
Container-title:Applied Physics A Materials Science & Processing
language:en
Short-container-title:Appl Phys A

Author:

Stepanyuk V.S.,Bazhanov D.I.,Baranov A.N.,Hergert W.,Katsnelson A.A.,Dederichs P.H.,Kirschner J.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s003390100580.pdf

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Molecular Dynamics Study of the Deposition and the Diffusion Behaviors of Al on a Cu Surface;Journal of the Korean Physical Society;2008-04-15

2. Kinetic Monte Carlo Simulation of Deposition of Co Thin Film on Cu(001);Plasma Science and Technology;2007-10

3. Computation of the Ehrlich-Schwoebel barrier to adatom diffusion in heteroepitaxial systems;Acta Physica Sinica;2007

4. Heteroepitaxial growth ofCo∕Cu(001): An accelerated molecular dynamics simulation study;Physical Review B;2005-07-06

5. Ab initio study of microscopic processes in the growth of Co on Cu(001);Applied Physics A;2005-02

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