Polynomial Neural Network Modeling of Reactive Ion Etching Process Using GMDH Method
Author:
Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/11760191_152.pdf
Reference10 articles.
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4. Han, S., Bidstrup, S., Kohl, P., May, G.: Modeling the Properties of PECVD Silicon Dioxide Films Using Optimized Back-Propagation Neural Networks. IEEE Trans. Comp. Pack. and Manufac. Part A 17(2), 174–182 (1994)
5. Ivakhnenko, A.: The Group Method of Data Handling - A Rival to Stochastic Approximation. Soviet Automat. Contr. 13(3) (1968)
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