Recognition of Plasma-Induced X-Ray Photoelectron Spectroscopy Fault Pattern Using Wavelet and Neural Network
Author:
Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/11760191_151.pdf
Reference10 articles.
1. Stevenson, J.O., Ward, P.P., Smith, M.L., Markle, R.J.: A Plasma Process Monitor/Control System. Surf. Interf. Anal. 26, 124–133 (1998)
2. Bose, F., Patrick, R., Baltes, H.: Measurement of Discharge Impedance for Dry Etch Proc-ess Control. SPIE 2336, 101–110 (1994)
3. Kim, B., Lee, C.: Monitoring Plasma Impedance Match Characteristics in a Multipole In-ductively Coupled Plasma for Process Control. J. Vac. Sci. Technol. A 18(1), 58–62 (2000)
4. Hong, S.J., May, G.S., Park, D.C.: Neural Network Modeling of Reactive Ion Etching Us-ing Optical Emission Spectroscopy Data. IEEE Trans. Semicond. Manufact. 16(4), 598–608 (2003)
5. Kim, B., Kim, S.: Partial Diagnostic Data to Plasma Etch Modeling Using Neural Network. Microelectron. Eng. 75(4), 397–404 (2004)
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