Fragmentation of dodecanethiol molecules: application to self-assembled monolayer damage in atom lithography-Reference-Cited by-同舟云学术

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Fragmentation of dodecanethiol molecules: application to self-assembled monolayer damage in atom lithography

Published:2000-05 Issue:5 Volume:70 Page:651-655
ISSN:0946-2171
Container-title:Applied Physics B
language:en
Short-container-title:Appl Phys B

Author:

Close J.D.,Baldwin K.G.H.,Hoffmann K.,Quaas N.

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://link.springer.com/content/pdf/10.1007/s003400050875.pdf

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Improved Self-assembled Monolayer of Octadecyltrichlorosilane as Positive Resist for Patterning Silicon Surface by Metastable Helium Atom Beam Lithography;Physics Procedia;2012

2. Silicon Micro/Nanofabrication Using Metastable Helium Atom Beam Lithography;Journal of Nanoscience and Nanotechnology;2010-11-01

3. Fabricating arrays of Si(110)/Si(100) microstructures by atom lithography using organosilane self-assembled monolayers;Journal of Physics: Conference Series;2009-09-01

4. Polyphenols content and antioxidant capacity of eggplant pulp;Food Chemistry;2009-06

5. Suppressing the fragmentation of fragile molecules in helium nanodroplets by coembedding with water: Possible role of the electric dipole moment;The Journal of Chemical Physics;2008-02-21

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