Cold vapor generation of Zn based on dielectric barrier discharge induced plasma chemical process for the determination of water samples by atomic fluorescence spectrometry-Reference-Cited by-同舟云学术

Cold vapor generation of Zn based on dielectric barrier discharge induced plasma chemical process for the determination of water samples by atomic fluorescence spectrometry

Published:2014-05-29 Issue:29 Volume:406 Page:7523-7531
ISSN:1618-2642
Container-title:Analytical and Bioanalytical Chemistry
language:en
Short-container-title:Anal Bioanal Chem

Author:

Zhu Zhenli,Liu Lu,Li Yixiao,Peng Huan,Liu Zhifu,Guo Wei,Hu Shenghong

Publisher

Springer Science and Business Media LLC

Subject

Biochemistry,Analytical Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00216-014-7911-8.pdf

Reference36 articles.

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3. Slachcinski M (2014) Recent achievements in sample introduction systems for use in chemical vapor generation plasma optical emission and mass spectrometry: from macro- to microanalytics. Appl Spectrosc Rev 49(4):271–321

4. Liu R, Wu P, Xu K, Lv Y, Hou XD (2008) Highly sensitive and interference-free determination of bismuth in environmental samples by electrothermal vaporization atomic fluorescence spectrometry after hydride trapping on iridium-coated tungsten coil. Spectrochim Acta B 63(6):704–709

5. Pohl P, Zapata IJ, Bings NH, Voges E, Broekaert JAC (2007) Optical emission spectrometric determination of arsenic and antimony by continuous flow chemical hydride generation and a miniaturized microwave microstrip argon plasma operated inside a capillary channel in a sapphire wafer. Spectrochim Acta B 62(5):444–453

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