Sputter-induced cross-contamination in analytical AES and XPS instrumentation: utilization of the effect for the in situ deposition of ultrathin functional layers-Reference-Cited by-同舟云学术

Sputter-induced cross-contamination in analytical AES and XPS instrumentation: utilization of the effect for the in situ deposition of ultrathin functional layers

Published:2013-03-06 Issue:22 Volume:405 Page:7145-7151
ISSN:1618-2642
Container-title:Analytical and Bioanalytical Chemistry
language:en
Short-container-title:Anal Bioanal Chem

Author:

Scheithauer Uwe

Publisher

Springer Science and Business Media LLC

Subject

Biochemistry,Analytical Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00216-013-6840-2.pdf

Reference21 articles.

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2. Wittmaack K (1985) Experimental and theoretical investigations into the origin of cross-contamination effects observed in a quadrupole-based SIMS instrument. Appl Phys A 38:235–252

3. Physical Electronics (2001) System specifications PHI model 680. Physical Electronics, Eden Prairie

4. Iwai H, Oiwa R, Larson PE, Kudo M (1997) Simulation of energy distribution for scanning X-ray probe. Surf Interface Anal 25:202–208

5. Physical Electronics (1997) The PHI Quantum 2000: a scanning ESCA microprobe. Physical Electronics, Eden Prairie

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