1. T. Hirai and S. Hayashi, ?Density and deposition rate of chemically vapour deposited Si3N4-TiN composites,? J. Mater. Sci.,18, 2401?2406 (1983).
2. N. Uchida, M. Koizumi, and M. Shimada, ?Fabrication of Si3N4 ceramics with metal nitride additives by isostatic hot-pressing,? J. Am. Ceram. Soc.,68, No. 2, 38?40 (1985).
3. M. Fukuhara, ?Effect of nitrogen on the ?/? phase conversion in silicon nitride,? J. Am. Ceram. Soc.,68, No. 9, 226?228 (1985).
4. E. A. Palchevskis, G. M. Kheidemane, Ya. P. Grabis, and T. N. Miller, ?Some physicochemical properties of finely disperse composite powders of silicon and titanium nitrides,? in: The Physical Chemistry and Technology of Disperse Powders, Inst. Probl. Materialoved., Akad. Nauk UkrSSR, Kiev (1984), pp. 46?49.
5. É. A. Palchevskis, G. M. Kheidemane, B. Ya. Bondars, et al., ?Investigation of some physicochemical properties of finely disperse powdered silicon and titanium nitrides,? in: High-Temperature Nitrides and Materials Based on Them, Inst. Probl. Materialoved., Akad. Nauk UkrSSR, Kiev (1985), pp. 115?122.