Electron field emission from nano-crystalline Si films deposited by inductively coupled plasma CVD at room temperature
Author:
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://link.springer.com/content/pdf/10.1007/s11434-005-0510-5.pdf
Reference14 articles.
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2. Satyanarayana, B. S., Robertson, J., Milne, W. I., Low threshold field emission from nanoclustered carbon grown by cathodic arc, J. Appl. Phys., 2000, 87: 3126–3131.
3. Jeong, S. H., Hwang, H. Y., Lee, K. H., Template-based carbon nanotubes and their application to a field emitter, Appl. Phys. Lett., 2001, 78: 2052–2054.
4. Küttel, O. M., Groening, O., Emmenegger, C. et al., Electron field emission from phase pure nanotube films grown in a methane/hydrogen plasma, Appl. Phys. Lett., 2001, 78: 2113–2115.
5. Takai, M., Yamashita, M., Wille, H. et al., Enhanced electron emission from n-type porous Si field emitter arrays, Appl. Phys. Lett., 1995, 66: 422–423.
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1. Optical properties and applications of hybrid semiconductor nanomaterials;Coordination Chemistry Reviews;2009-12
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