Modeling the Wafer Temperature in a LPCVD Furnace
Author:
Kersch A.,Schäfer M.
Publisher
Springer Vienna
Reference3 articles.
1. H. De Waardt and W. L. De Koning, Automatica, vol.28, p.243, 1982
2. T. A. Badgwell, I. Trachtenberg and T. F. Edgar, “Modeling the Wafer Temperature Profile in a Multiwafer LPCVD Furnace”, J. Electrochem. Soc., vol 141, p.161, 1994
3. PHOENICS-CVD, CHAM, Wimbledon, 1995