Air microwave-induced plasma: Detection of NO in the post-discharge using an ArF laser-Reference-Cited by-同舟云学术

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Air microwave-induced plasma: Detection of NO in the post-discharge using an ArF laser

Published:1993-06 Issue:2 Volume:13 Page:351-364
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Lalo C.,Deson J.,Cerveau C.,Ben-Aim R. I.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF01466049.pdf

Reference24 articles.

1. K. J. Rensberger, J. B. Jeffries, R. A. Copeland, K. Kohse-Hoinghaus, M. L. Wise, and D. R. Crosley,Appl. Opt. 28, 3556 (1989).

2. C. Lalo, J. Masanet, J. Deson, R. Ben-Aim, and J. Rostas,Appl. Spectrosc. 44, 442 (1990).

3. C. Lalo, J. Deson, N. Dat, and R. Ben-Aim,Appl. Spectrosc. 45, 501 (1990).

4. K. Shibuya and F. Stuhl,Chem. Phys. 79, 367 (1983).

5. J. Deson, C. Lalo, J. Masanet, and J. Tardieu de Maleissye,Chem. Phys. 119, 343 (1988).

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