1. Maissel, L.: Application of Sputtering to the Depositon of Films. In: Maissel, L., Glang, R. (eds.), Handbook of Thin Film Technology, New York, McGraw-Hill 1970 (review)
2. See for example, VepŘek, S.: Pure Appl. Chem. 48, 163 (1976)
3. For a review see, Coburn, J. W., Winters, H. F.: J. Vac. Sci. Technol. 16, 391 (1979)
4. Hudis, M.: Plasma Treatment of Solid Materials. In: Techniques and Applications of Plasma Chemistry, Hollahan, J. R., Bell, A. T. (eds.), New York, John Wiley & Sons 1974
5. Hagstrum, H. D.: Phys. Rev. 96, 336 (1954)