Precise Compensation for Positional Accuracy of Ultra-Precision Air-Bearing Motion Stage Based on the Self-Calibration Method-Reference-Cited by-同舟云学术

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Precise Compensation for Positional Accuracy of Ultra-Precision Air-Bearing Motion Stage Based on the Self-Calibration Method

Published:2021-04-27 Issue:6 Volume:22 Page:1039-1048
ISSN:2234-7593
Container-title:International Journal of Precision Engineering and Manufacturing
language:en
Short-container-title:Int. J. Precis. Eng. Manuf.

Author:

Huang Shengzhou^ORCID

Funder

Natural Science Foundation of Anhui Province

Scientific Research Foundation for the Introduction of Talent of Anhui Polytechnic University

Additive Manufacturing Institute, Anhui Polytechnic University

Key Project of Natural Science Research of Anhui Province

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Mechanical Engineering

Link

https://link.springer.com/content/pdf/10.1007/s12541-021-00526-w.pdf

Reference30 articles.

1. Kim, K.-S., Kim, J.-H., Choi, J.-Y., & Lee, C.-M. (2011). A review on research and development of laser assisted turning. International Journal of Precision Engineering and Manufacturing, 12(4), 753–759

2. Iwasaki, W., Takeshita, T., Peng, Y., Ogino, H., Shibata, H., Kudo, Y., Maeda, R., & Sawada, R. (2012). Maskless lithographic fine patterning on deeply etched or slanted surfaces and grayscale lithography using newly developed digital mirror device lithography equipment. Japanese Journal of Applied Physics, 51(6S), 06FB05

3. Lan, H., Ding, Y., Liu, H., & Lu, B. (2007). Review of the wafer stage for nanoimprint lithography. Microelectronic Engineering, 84(4), 684–688

4. Ihn, Y. S., Ji, S.-H., Moon, H., Choi, H. R., & Koo, J. C. (2012). A dual step precision multi-DOF stage for maskless digital lithography. Microsystem technologies, 18(9–10), 1741–1750

5. Li, Z. Y., Choi, J. Y., Ihn, Y. S., Ji, S.-H., & Koo, J. C. (2015). Parallel micro manipulator for optical spot array alignment of maskless lithography. Microsystem Technologies, 21(12), 2663–2668

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1. Dynamic Separation Model-Based Sliding Mode Control with Adaptive Neural Network Compensators for a Reluctance Actuator Motion System;International Journal of Precision Engineering and Manufacturing;2024-05-29

2. A self-calibration scheme for two-dimensional free-form probing measurement under the assumption of rigid-body machine kinematic model;Measurement;2023-11

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