Cleaning of carbon-contaminated optics using O2/Ar plasma-Reference-Cited by-同舟云学术

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Cleaning of carbon-contaminated optics using O2/Ar plasma

Published:2017-08-05 Issue:9 Volume:28 Page:
ISSN:1001-8042
Container-title:Nuclear Science and Techniques
language:en
Short-container-title:NUCL SCI TECH

Author:

Zhang Yi-Fei,Luo Hong-Xin,Guo Zhi,Zhen Xiang-Jun,Chen Ming,Liu Jun-Nan

Publisher

Springer Science and Business Media LLC

Subject

Nuclear Energy and Engineering,Nuclear and High Energy Physics

Link

http://link.springer.com/article/10.1007/s41365-017-0274-z/fulltext.html

Reference22 articles.

1. F. Eggenstein, F. Sent, T. Zeschke et al., Cleaning of contaminated XUV-optics at BESSY II. Nucl. Instrum. Methods A (2001). doi: 10.1016/SO168-9002(01)00312-6

2. T. Koide, T. Shidara, M. Yanagihara et al., Resuscitation of carbon-contaminated mirrors and gratings by oxygen-discharge cleaning. 2: Efficiency recovery in the 100-1000-eV range. Appl. Opt. 27, 4305–4313 (1988). doi: 10.1364/AO.27.004305

3. R.W.C. Hansen, M. Bissen, D. Wallace et al., Ultraviolet/ozone cleaning of carbon-contaminated optics. Appl. Opt. 32, 4114–4118 (1993). doi: 10.1364/AO.32.004114

4. T. Koide, M. Yanagihara, S. Sato et al., Resuscitation of carbon-contaminated mirrors and gratings by oxygen-discharge cleaning 1: Efficiency recovery in the 4–40-eV range. Appl. Opt. 26, 3884–3894 (1987). doi: 10.1364/AO.26.003884

5. G. Guehenneux, M. Veillerot, I. Tovena, Evaluation of airborne molecular contamination inside the LIL. Nucl. Instrum. Methods A 557, 676–683 (2006). doi: 10.1016/j.nima.2005.11.16

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