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Reference25 articles.
1. K. Yagi, S. Tamura, T. Tokuyama: Jpn. J. Appl. Phys. 16, 245–251 (1977)
2. T. Tokuyama, K. Yagi, K. Miyake, M. Tamura, N. Natsuaki, S. Tachi: Nucl. lnstrum. Methods 182/183, Part I, 241–250 (1981)
3. K. Miyake, T. Tokuyama: In Direct ion beam deposition in ion beam assised film growth, ed. by T. Itoh (Elsevier, Amsterdam, 1989) Chap. 8, pp. 289–318
4. K. Miyake: In Handbook of thin film process technology, ed. by D.A. Glocker, S.I. Shah (Institute of Physics Publishing, Bristol 1997) A3.4.1
5. J.M.E. Harper: Ion beam deposition. In Thin film processes, ed. by J.L. Vossen and W. Kern (Academic Press, New York 1978) pp. 175–206