Atomic and Molecular Data for Industrial Application Plasmas

Author:

Song M.-Y.,Kwon D.-C.,Jhang W.-S.,Kwang S.-H.,Park J.-H.,Kang Y.-K.,Yoon J.-S.

Publisher

Springer Berlin Heidelberg

Reference55 articles.

1. M. Loidl et al., Mucl. Instr. Meth. A 559, 769 (2006)

2. D.W. Shoesmith, J. Nucl. Mater. 282, 1 (2000)

3. G.R. Choppin, M.Kh. Khankhasayev, in Chemical Separation Technologies and Related Methods of Nuclear Waste Management. NATO Science Series (Kluwer, Dordrecht, 1999)

4. National Research Council, Plasma Processing of Materials: Scientific Opportunities and Technological Challenges(National Academic Press, Washington, DC, 1991)

5. National Research Council: Database Needs for Modeling and Simulation of Plasma Processing(National Academic Press, Washington, DC, 1996)

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