Author:
Im Ik-Tae,Jo Hyun Seob,Oh Sung Hoon,So Byung Moon
Publisher
Springer Berlin Heidelberg
Reference7 articles.
1. Anderson, W.A.: Electrical and Dielectric Properties of Thin Film BaTiO3 Capacitors deposited by Ratio Frequency Magnetron Sputtering. J. Vac. Sci., Technal. A10(4), 733–736 (1992)
2. Anderson., W.A., et al.: Effect of Barrier Layer on BaTiO3 Thin Film Capacitors on si substrates. J. Elece, Mat. 23(1), 53–56 (1994)
3. Shintani, Y., et al.: Behaviors of High-Energy Electrons and Neutral Atom in the Sputtering of BaTiO3. Jpn. J. Appl. Phy. 14(12), 1875–1879 (1975)
4. Felderman, C.: Formation of Thin Films of BaTiO3 by Evaporation. Rev. Sci. Instrum. 12(6), 463–466 (1955)
5. Dervies, R.C.: On the Preparation of the Single-Crystal Films of BaTiO3. J. Am. Ceramic. Soc. 45, 225–228 (1962)