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New Ion Implantation Areas

Published:1971 Issue: Volume: Page:430-438
ISSN:
Container-title:Ion Implantation in Semiconductors
language:
Short-container-title:

Author:

Brown W. L.

Publisher

Springer Berlin Heidelberg

Link

http://link.springer.com/content/pdf/10.1007/978-3-642-80660-5_59.pdf

Reference14 articles.

1. Thompson, M.W.: European Conference in Ion Implantation, 109, P. Peregrinus Ltd. (1970).

2. Carter, G.: Comment in Discussion at the Garmisch Conference.

3. MacRae, A.U.: Informal Session on Implantation Machines, Garmisch Conference.

4. Miller, S.E.: The Bell System Technical Journal 48, 2059 (1969).

5. Marcatili, E.A.J.: The Bell System Technical Journal 48, 2071 (1969).

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ion Implantation and Channeling;Treatise on Solid State Chemistry;1976

2. Ion Implantation;Semiconducting Devices;1976

3. Lattice disorder in alumina single crystals produced by ion bombardment;Journal of Materials Science;1973-11

4. The Influence of Ion Bombardment on the Corrosion of Metals;Ion Implantation in Semiconductors and Other Materials;1973

5. Die Ionenimplantation als Dotiertechnologie;Advances in Solid State Physics

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