Effects of Process Variation on the Access Time in SRAM Cells

Author:

Lorente Vicent,Sahuquillo Julio

Publisher

Springer Berlin Heidelberg

Reference13 articles.

1. Nassif, S.: Modeling and analysis of manufacturing variations. In: IEEE Conference on Custom Integrated Circuits, pp. 223–228 (2001)

2. Hocevar, D., Cox, P., Yang, P.: Parametric yield optimization for MOS circuit blocks. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 7(6), 645–658 (1988)

3. Bhavnagarwala, A., Tang, X., Meindl, J.: The impact of intrinsic device fluctuations on CMOS sram cell stability. IEEE Journal of Solid-State Circuits 36(4), 658–665 (2001)

4. Heald, R., Wang, P.: Variability in sub-100nm SRAM designs. In: IEEE/ACM International Conference on Computer Aided Design, ICCAD 2004, pp. 347–352 (November 2004)

5. Burnett, D., Erington, K., Subramanian, C., Baker, K.: Implications of fundamental threshold voltage variations for high-density SRAM and logic circuits. In: 1994 Symposium on VLSI Technology, Digest of Technical Papers, pp. 15–16 (June 1994)

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