Characteristics of PbTiO3 thin films on Pt/Ti/SiO2/Si by continuous cooling process-Reference-Cited by-同舟云学术

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Characteristics of PbTiO3 thin films on Pt/Ti/SiO2/Si by continuous cooling process

Published:1996-11 Issue:22 Volume:31 Page:5877-5883
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Yoon Y. S.,Kim J. H.,Choi W. K.,Lee S. J.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF01152136.pdf

Reference31 articles.

1. M. D. Carper andP. P. Phule,Appl. Phys. Lett. 63 (1993) 163.

2. A. Grill, W. Kane, J. Viggiano, M. Brady andR. Laibowitz,J. Mater. Res. 7 (1992) 3260.

3. G. R. Bai, H. L. M. Chang, H. K. Kim, C. M. Foster andD. J. Lam,Appl. Phys. Lett. 61 (1992) 408.

4. G. H. Harttling,J. Vac. Sci. Technol. 49 (1989) 414.

5. M. de Keijser, G. J. M. Dormans, J. F. M. Cillessen, D. M. de Leeuw andH. W. Zandbergen,Appl. Phys. Lett. 58 (1991) 2636.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic layer deposition and post-deposition annealing of PbTiO3 thin films;Thin Solid Films;2006-02

2. RuO2/Ru electrode on Si3N4/Si substrate for microelectromechanical systems devices based on Pb(Zr1-xTix)O-3 film and surface micromachining;Journal of Materials Science: Materials in Electronics;1998

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