Radio frequency plasma processing to produce chromium sputter targets-Reference-Cited by-同舟云学术

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Radio frequency plasma processing to produce chromium sputter targets

Published:2000-12 Issue:4 Volume:9 Page:488-493
ISSN:1059-9630
Container-title:Journal of Thermal Spray Technology
language:en
Short-container-title:J Therm Spray Tech

Author:

Müller M.,Heimann R. B.,Gitzhofer F.,Boulos M. I.,Schwarz K.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Surfaces, Coatings and Films,Condensed Matter Physics

Link

http://link.springer.com/content/pdf/10.1007/BF02608551.pdf

Reference11 articles.

1. W. Kunert and A. Köhler:VDI Berichte, 1992, vol. 917, pp. 107–13 (in German).

2. K. Schwarz, W. Kunert, and A. Köhler:DVS-Berichte, 1996, vol. 175, pp. 170–73 (in German).

3. A. Köhler, W. Kunert, and K. Schwarz:DVS-Berichte, 1993, vol. 152, pp. 181–84 (in German).

4. H. Schumann: inMetallographie, 13th ed., Deutscher Verlag für Grundstoffindustrie, Leipzig, 1990.

5. M. Müller: Master’s Thesis, Freiberg University of Mining and Technology, Freiberg, Germany, 1994 (in Germany).

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