High rate deposition system for metal-cluster/SiO x C y H z –polymer nanocomposite thin films

Author:

Peter T.,Rehders S.,Schürmann U.,Strunskus T.,Zaporojtchenko V.,Faupel F.

Publisher

Springer Science and Business Media LLC

Subject

Condensed Matter Physics,General Materials Science,Modeling and Simulation,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

Reference24 articles.

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2. Beyene HT, Tichelaar FD, Peeters P, Kolev I, van de Sanden MCM, Creatore M (2010) Hybrid sputtering-remote PECVD deposition of Au nanoparticles on SiO2 layers for surface plasmon resonance-based colored coatings. Plasma Process Polym. doi: 10.1002/ppap.201000003

3. D’Addato S, Gragnaniello L, Valeri S, Rota A, Di Bona A, Spizzo F, Panozaqi F, Schifano SF (2010) Morphology and magnetic properties of size-selected Ni nanoparticle films. J Appl Phys 10(1063/1):3374467

4. Despax B, Raynaud P (2007) Deposition of “polysiloxane” thin films containing silver particles by an RF asymmetrical discharge. Plasma Process Polym. doi: 10.1002/ppap.200600083

5. Fang J, Chen H, Yu X (2001) Studies on plasma polymerization of hexamethyldisiloxane in the presence of different carrier gases. J Appl Polym Sci. doi: 10.1002/app.1233

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