Absolute partial and total electron ionization cross sections for CCl4 from threshold up to 180 eV-Reference-Cited by-同舟云学术

Absolute partial and total electron ionization cross sections for CCl4 from threshold up to 180 eV

Published:1984-12 Issue:4 Volume:4 Page:235-249
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Leiter K.,Stephan K.,M�rk E.,M�rk T. D.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF00568978.pdf

Reference28 articles.

1. T. D. Märk inElectron Molecule Interactions and their Applications, Vol. 2, L. G. Christophorou, ed., Academic Press, New York (1984), Chap. 3; T. D. Märk and G. H. Dunn (eds.),Electron Impact Ionization, Springer, Wien, New York (1984).

2. See references in T. D. Märk,Beitr. Plasmaphys. 22, 275 (1982);Int. J. Mass Spectrom. Ion Phys. 45, 125 (1982).

3. K. Stephan, K. Leiter, H. Deutsch, and T. D. Märk,Proc. 13th ICPEAC, Berlin (1983), p. 276; K. Leiter, Diplomarbeit, Universität Innsbruck (1983).

4. G. C. Schwartz and P. M. Schaible,J. Vac. Sci. Technol. 16, 54 (1979); D. L. Flamm and V. M. Donnelly,Plasma Chem. Plasma Proc. 1, 317 (1981); F. W. Breitbarth and H. J. Tiller,Beitr. Plasmaphys. 21, 423 (1981); H. J. Tiller, R. Mohr, D. Berg, F. W. Breitbarth, K. Dumke, and R. Göbel,Beitr. Plasmaphys. 21, 329 (1981); J. W. Coburn,Plasma Chem. Plasma Proc. 2, 1 (1982); H. J. Tiller, F. W. Breitbarth, G. Pfauch, and R. Göbel,Beitr. Plasmaphys. 23, 519 (1983); R. A. Gottscho, G. P. Davis, and R. H. Burton,Plasma Chem. Plasma Proc. 3, 193 (1983).

5. M. Cottin, M. H. Ducroquet, and C. Martiens,Proc. 2nd I.C.I.S., Vienna (1972), p. 895.

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