He-N2 radiofrequency discharge: Influence of N2 on discharge and afterglow-Reference-Cited by-同舟云学术

He-N2 radiofrequency discharge: Influence of N2 on discharge and afterglow

Published:1991-09 Issue:3 Volume:11 Page:335-355
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

De Benedictis S.,Dilecce G.,Gorse C.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF01458915.pdf

Reference30 articles.

1. C. Gorse, S. De Benedictis, G. Dilecce, and M. Capitelli,Spectrochim. Acta 45B, 521 (1990).

2. C. Gorse, M. Cacciatore, M. Capitelli, S. De Benedictis, and G. Dilecce,Chem. Phys. 119, 83 (1988).

3. F. Paniccia, C. Gorse, J. Bretagne, and M. Capitelli,J. Appl. Phys. 59, 4004 (1986).

4. G. Dilecce, M. Capitelli, S. De Benedictis, and C. Gorse,Proc. ISPC-8, Tokyo, Vol. 1 (1987), p. 238.

5. J. H. Kolts and D. W. Setser, ?Electronically excited long-lived states of atoms and diatomic molecules in a flow system,? inReactive Intermediates in the Gas Phase, Academic Press. Inc., New York (1976), Chapter 3, p. 151.

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