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Measurement of electron densities by a microwave cavity method in 13.56-MHz RF plasmas of Ar, CF4, C2F6, and CHF3

  • Published:1991-09 Issue:3 Volume:11 Page:357-370
  • ISSN:0272-4324
  • Container-title:Plasma Chemistry and Plasma Processing
  • language:en
  • Short-container-title:Plasma Chem Plasma Process

Author:

Haverlag M.,Kroesen G. M. W.,Bisschops T. H. J.,de Hoog F. J.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

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