A critical evaluation of low-energy electron impact cross sections for plasma processing modeling. I: Cl2, F2, and HCl-Reference-Cited by-同舟云学术

A critical evaluation of low-energy electron impact cross sections for plasma processing modeling. I: Cl2, F2, and HCl

Published:1992-12 Issue:4 Volume:12 Page:449-476
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Morgan W. L.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF01447254.pdf

Reference104 articles.

1. M. Rokni and J. H. Jacob, inApplied Atomic Collision Physics, Vol. 3: Gas Lasers, H. S. W. Massey, E. W. McDaniel, and B. Bederson, eds., Academic Press, New York (1982), p. 273.

2. W. L. Nighan, ibid., p. 319.

3. M. R. Flannery, ibid., p. 141.

4. D. R. Bates,Adv. At. Mol. Phys. 20, 1 (1985).

5. D. M. Manos and D. L. Flamm,Plasma Etching, Academic Press, Boston (1989).

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