Chemical vapor deposition of refractory metals from fluoride gases

Author:

Lakhotkin Yu. V.,Kuz’min V. P.,Rybkina T. I.,Kovalev A. B.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Metals and Alloys,Inorganic Chemistry,General Chemical Engineering

Reference15 articles.

1. Syrkin, V.G.,Karbonil’nye metally (Carbonyl Metals), Moscow: Metallurgiya, 1978.

2. Evstyukhin, A.I., Yanchur, V.P., Smirnov, V.P., and Shulov, VA., Preparation of Tungsten Coatings by Chemical Transport of Tungsten Bromides, inMaterialy dlya atomnoi tekhniki (Nuclear Materials), Moscow: Energoatomizdat, 1983, pp. 3–10.

3. Ivanov, V.E., Nechiporenko, E.P., Krivoruchko, V.M., and Sagalovich, V.V.,Kristallizatsiya tugoplavkikh metallov iz gazovoi fazy (Vapor Deposition of Refractory Metals), Moscow: Atomizdat, 1974.

4. Miller, A. and Barnett, G.D., Chemical Vapor Deposition of Tungsten at Low Pressure,J. Electrochem. Soc., 1962, vol. 109, no. 10, pp. 973–976.

5. Korolev, Yu.M., Solov’ev, V.F., Stolyarov, V.I.,et al., Properties of Tungsten Deposited by the Fluoride Process, inMetallurgiya i metallovedenie chistykh metallov (Metallurgy and Physical Chemistry of Pure Metals), Moscow: Atomizdat, 1975, issue 11, pp. 15–23.

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