Interface and Bulk Trapping Centers in Low Temperature Ion-Beam Sputtered Silicon Dioxide Films
Author:
Zvanut M. E.,Feigl F. J.
Reference18 articles.
1. J. R. Sites, P. Gilstrap, and R. Rujkorakarn, Opt. Engr. 22, 447 (1983).
2. S. Suyama, A. Odamoto, and T. Serikawa, J. Appl. Phys. 62, 2360 (1987).
3. A. Ourmazd, D. W. Taylor, J. A. Rentschler, and J. Bevk, Phys. Rev. Let. 59, 213 (1987).
4. S. I. Raider, R. F u tsch, and M. J. Palmer, J. Electrochem. Soc. 122, 413 (1975).
5. P. Solomon, J. Appl. Phys. 48, 3843 (1977).