Author:
Schram D. C.,Benoy D. A.,Beulens J. J.,Buuron A. J. M.,Fey F. H. A. G.,de Graaf M. J.,Meeusen G. J.,Meulenbroeks R. F. G.,van der Mullen J. A. M.,de Regt J. M.,van de Sanden M. C. M.,Qing Z.
Reference42 articles.
1. P. Fauchais, J.F. Coudert and M. Vardelle, “Diagnostics in thermal plasma processing”, Ch. lin Plasma diagnostics, Vol. 1, 0. Auciello Sc D.L. Flamm (ed.), Academic Press, Boston (1989).
2. V.M. Donally, “Optical diagnostic techniques for low pressure plasmas and plasma prosesses”, Ch. 1.
3. J. Mostaghimi, P. Proulx and M.I. Boulos, “A two-temperature model of the inductively coupled rf plasma”, J. Appl. Phys. 61: 1753 (1987).
4. D.C. Schram, I.J.M.M. Raaijmakers, B. van der Sijde, H.J.W. schenkelaars and P.W.J.M. Boumans, “Approaches for clarifying excitation mechanisms in spectrochemical excitation sources”, Spectrochim. Acta 38B: 1545–1557 (1983).
5. J.A.M. van der Mullen, “Excitation equilibria in plasmas; A classification”, Physics Report 191: 109 (1990).