Funder
National Research Foundation of Korea
Nano-Material Technology Development Program
Korea Institute for Advancement of Technology
Publisher
Springer Science and Business Media LLC
Reference28 articles.
1. N. Taga, M. Maekawa, Y. Shigesato, I. Yasui, M. Kamei, T.E. Haynes, “Deposition of heteroepitaxial in 2O3 thin films by molecular beam epitaxy. Jpn. J. Appl. Phys. 37, 6524–6529 (1998)
2. C. Nunes, A.M. de Carvalho, Botelho do Rego, A Amaral, P Brogueira and G Lavareda, Effect of substrate temperature on the surface structure, composition and morphology of indium–tin oxide films. Surf. Coat. Technol. 124, 70–75 (2000)
3. A.A. Serkov et al., Laser sintering of gravure printed indium tin oxide films on polyethylene terephthalate for flexible electronics. Sci. Rep. 9(1), 1773 (2019)
4. O. Malik, F.J. de la Hidalga-Wade, Sputtered indium tin oxide films for optoelectronic applications. Optoelectron.-Adv. Device Struct. 4, 297–314 (2017)
5. K. Maki, N. Komiya, A. Suzuki, Fabrication of thin films of ITO by aerosol CVD. Thin Solid Films 445(2), 224–228 (2003)