XPS and EIS studies to account for the passive behavior of the alloy Ti-6Al-4V in Hank’s solution
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Electrochemistry,Condensed Matter Physics,General Materials Science
Link
http://link.springer.com/content/pdf/10.1007/s10008-019-04368-5.pdf
Reference33 articles.
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3. Sodhi RNS, Weninger A, Davis JE, Sreenivas K (1991) X-ray photoelectron spectroscopy comparison of sputtered Ti, Ti6Al4V and passive bulk metals for use in cell culture techniques. J Vac Sci Technol A 9:1329–1333
4. Okazaki Y, Tateishi T, Ito Y (1997) Corrosion resistance of implant alloys in pseudo physiological solution and role of alloying elements in passive films. Mater Trans JIM 38:78–84
5. Schmidt H, Schminke A, Schmiedgen M, Baretzky B (2001) Compound formation and abrasion resistance of ion-implanted Ti6Al4V. Acta Mater 49:487–495
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