A run-to-run controller for a chemical mechanical planarization process using least squares generative adversarial networks
Author:
Funder
Ministry of Science and ICT
Publisher
Springer Science and Business Media LLC
Subject
Artificial Intelligence,Industrial and Manufacturing Engineering,Software
Link
https://link.springer.com/content/pdf/10.1007/s10845-020-01639-1.pdf
Reference43 articles.
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3. Butler, S. W., & Stefani, J. A. (1994). Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry. IEEE Transactions on Semiconductor Manufacturing, 7(2), 193–201. https://doi.org/10.1109/66.286855.
4. Chang, Y.-J., Kang, Y., Hsu, C.-L., Chang, C.-T., & Chan, T. Y. (2006). Virtual metrology technique for semiconductor manufacturing. In Proceedings of the IEEE international joint conference on neural network (pp. 5289–5293). https://doi.org/10.1109/IJCNN.2006.247284.
5. Chen, C. T., & Chuang, Y. C. (2010). An intelligent run-to-run control strategy for chemical–mechanical polishing processes. IEEE Transactions on Semiconductor Manufacturing, 23(1), 109–120. https://doi.org/10.1109/TSM.2009.2039186.
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