1. Analog Devices. (2015). ADXL327 data sheet.
http://www.analog.com/static/imported-files/data_sheets/ADXL327.pdf
. Accessed 15 August 2015
2. Bao, J., & Spanos, C. J. (2001). A simulation framework for lithography process monitoring and control using scatterometry. In AEC/APC Symposium XIII, Abstract available via
http://impact.berkeley.edu/archive/secure/archives/seminars/abstracts/Junwei100101.pdf
. Accessed 15 August 2015
3. Cholettte, M., Celen, M., Djurdjanovic, D., & Rasberry, J. (2013). Condition monitoring and operational decision making in semiconductor manufacturing. IEEE Transactions on Semiconductor Manufacturing, 26(4), 454–464.
4. Coates, M., & Fitzgerald, W. (1999). Regionally optimised time–frequency distributions using finite mixture models. Signal Processing, 77(3), 247–260.
5. Cohen, L. (1995). Time–frequency analysis: Theory and applications (1st ed.). Englewood Cliffs: Prentice Hall.