Optimization of RF sputtering process parameters on electrical resistivity, deposition rate and sensitivity of Al-doped ZnO thin films grown on Si substrate using grey-Taguchi technique-Reference-Cited by-同舟云学术

Optimization of RF sputtering process parameters on electrical resistivity, deposition rate and sensitivity of Al-doped ZnO thin films grown on Si substrate using grey-Taguchi technique

Published:2019-04-24 Issue:3 Volume:42 Page:
ISSN:0250-4707
Container-title:Bulletin of Materials Science
language:en
Short-container-title:Bull Mater Sci

Author:

Vanmathi M^ORCID,Ismail M Mohamed,Kumar M Senthil

Publisher

Springer Science and Business Media LLC

Subject

Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/s12034-019-1800-x.pdf

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