1. B. Park, Y.H. Huh, H.G. Jeon, C.H. Park, T.K. Kang, B.H. Kim, and J. Park, J. Appl. Phys. 108, 94506 (2010).
2. F. Xu, D.Q. Yang, K.L. Jiang, and W. Guo, Chin. Chem. Lett. 17, 187 (2006).
3. E.E. Ebenso, I.B. Obot, and L.C. Murulana, Int. J. Electrochem. Sci. 5, 1574 (2010).
4. F.F. Runge, Ann. Der Phys. Und Chemie 31, 65 (1834).
5. F.C. Correia, T.C.F. Santos, J.R. Garcia, L.O. Peres, and S.H. Wang, J. Braz. Chem. Soc. 26, 84 (2015).