Analysis of Negative Capacitance Source Pocket Double-Gate TFET with Steep Subthreshold and High ON–OFF Ratio
Author:
Publisher
Springer Science and Business Media LLC
Link
https://link.springer.com/content/pdf/10.1007/s11664-024-11102-z.pdf
Reference39 articles.
1. R. Dennard, F. Gaensslen, W.-N. Yu, L. Rideout, E. Bassous, and A. Le Blanc, Design of ion-implanted small MOSFET’S dimensions with very. IEEE J. Solid State Circuits 9(5), 257 (1974).
2. A. Chaudhry and M.J. Kumar, Controlling short-channel effects in deep-submicron SOI MOSFETs for improved reliability: a review. IEEE Trans. Device Mater. Reliab.Reliab. 4(1), 99 (2004). https://doi.org/10.1109/TDMR.2004.824359.
3. K. Singh, S. Kumar, E. Goel, B. Singh, S. Dubey, and S. Jit, Effects of elevated source/drain and side spacer dielectric on the drivability optimization of non-abrupt ultra shallow junction gate underlap DG MOSFETs. J. Electron. Mater. 46, 520 (2017). https://doi.org/10.1007/s11664-016-4912-8.
4. Q. Xie, J. Xu, and Y. Taur, Review and critique of analytic models of MOSFET short-channel effects in subthreshold. IEEE Trans. Electron Devices 59(6), 1569 (2012). https://doi.org/10.1109/TED.2012.2191556.
5. Malvika, B. Choudhuri, and K. Mummaneni, A review on a negative capacitance field-effect transistor for low-power applications. J. Electron. Mater. 51, 923 (2022). https://doi.org/10.1007/s11664-021-09384-8.
Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Characterization and High‐Frequency Applications of Barium Antimonide Thin Films for Voltage‐Controlled Negative Capacitance and 6G Technology;physica status solidi (a);2024-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3