Optical, Electrical, and Crystal Properties of TiO2 Thin Films Grown by Atomic Layer Deposition on Silicon and Glass Substrates-Reference-Cited by-同舟云学术

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Optical, Electrical, and Crystal Properties of TiO2 Thin Films Grown by Atomic Layer Deposition on Silicon and Glass Substrates

Published:2018-05-22 Issue:8 Volume:47 Page:4502-4507
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:Journal of Elec Materi

Author:

Kupa I.,Unal Y.,Cetin S. S.,Durna L.,Topalli K.,Okyay A. K.,Ates H.

Funder

Gazi Üniversitesi

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/article/10.1007/s11664-018-6370-y/fulltext.html

Reference42 articles.

1. W. Chiappim, G.E. Testoni, R.S. Moraes, R.S. Pessoa, J.C. Sagas, F.D. Origo, L. Vieira, and H.S. Maciel, Vacuum 123, 91 (2016).

2. C.S. Kovash Jr., J.D. Hoefelmeyer, and B.A. Logue, Electrochim. Acta 67, 18 (2012).

3. P.J. Cameron and L.M. Peter, J. Phys. Chem. B 109, 7392 (2005).

4. T.W. Hamann, A.B.F. Martinson, J.W. Elam, M.J. Pellin, and J.T. Hupp, J. Phys. Chem. C 112, 10303 (2008).

5. D.H. Kim, M. Woodroof, K. Lee, and G.N. Parsons, ChemSusChem 6, 1014 (2013).

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