Nickel silicidation techniques for strained Si1−xGex, Si1−x−yGexCy, and Si1−yCy alloys material-device applications-Reference-Cited by-同舟云学术

Nickel silicidation techniques for strained Si1−xGex, Si1−x−yGexCy, and Si1−yCy alloys material-device applications

Published:2003-03 Issue:3 Volume:32 Page:184-190
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:Journal of Elec Materi

Author:

Shi Zhongha,Onsongo David,Chen Xiao,Kim Dong-won,Nieh Renee E.,Banerjee Sanjay K.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s11664-003-0191-2.pdf

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