Author:
Zagho Moustafa M.,Dawoud Hana D.,Bensalah Nasr,Altahtamouni T. M.
Publisher
Springer Science and Business Media LLC
Subject
Waste Management and Disposal,Renewable Energy, Sustainability and the Environment,Biomaterials,Ceramics and Composites
Reference130 articles.
1. Prakash A. Deposition and characterization studies of boron carbon nitride (BCN) thin films prepared by dual target sputtering (PhD Thesis) 2016
2. D.R. Gibson, I. Brinkley, E. Waddell, J.M. Walls, Proc. SPIE 7101, 710108 (2008)
3. E. Pascual, E. Martı, J. Esteve, A. Lousa, Boron carbide thin films deposited by tuned-substrate RF magnetron sputtering. Diam. Relat. Mater. 8, 402–405 (1999)
4. K. Koski, J. Ho, Voltage controlled reactive sputtering process for aluminium oxide thin films. Thin Solid Films 326, 189–193 (1998)
5. A. Kossoy, R.L. Magnusson, T.K. Tryggvason, K. Leosson, S. Olafsson, Method to control deposition rate instabilities—high power impulse magnetron sputtering deposition of TiO2. J. Vac. Sci. Technol. A Vac. Surf. Film 33, 21514 (2015)
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