High accuracy method for Auger analysis of the composition of uncleaned silicon oxide surface-Reference-Cited by-同舟云学术

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High accuracy method for Auger analysis of the composition of uncleaned silicon oxide surface

Published:2004-10 Issue:10 Volume:47 Page:1032-1038
ISSN:0543-1972
Container-title:Measurement Techniques
language:en
Short-container-title:Meas Tech

Author:

Kostishko B. M.,Appolonov S. V.,Salomatin S. Ya.

Publisher

Springer Science and Business Media LLC

Subject

Applied Mathematics,Instrumentation

Link

http://link.springer.com/content/pdf/10.1007/s11018-005-0053-9.pdf

Reference20 articles.

1. L. Feldman and D. Meyer, Bases of Analyzing the Surface of Thin Films [Russian translation], Mir, Moscow (1989).

2. R. Maller and T. Keimins, Elements of Integral Circuits [Russian translation], Mir, Moscow (1989).

3. L. Firmens et al. (eds.), Electron and Ion Spectroscopy of Solids [Russian translation], Mir, Moscow (1981).

4. V. A. Gorelik, R. M. Kasparyan, and Zh. P. Rusakova, Élektron. Prom., No. 2 (130), 55 (1984).

5. V. I. Zaporozhchenko, Élektron. Prom., No. 11(72)–12(72), 36 (1978).

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1. Formation of silicon carbide nanocrystals by high-temperature carbonization of porous silicon;Technical Physics;2007-08

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