Diffusion in the nickel-rich part of the Ni−Al system at 1000° to 1300°C; Ni3Al layer growth, diffusion coefficients, and interface concentrations-Reference-Cited by-同舟云学术

Diffusion in the nickel-rich part of the Ni−Al system at 1000° to 1300°C; Ni3Al layer growth, diffusion coefficients, and interface concentrations

Published:1973-06 Issue:6 Volume:4 Page:1623-1633
ISSN:1073-5615
Container-title:Metallurgical and Materials Transactions B
language:en
Short-container-title:Metall Mater Trans B

Author:

Janssen M. M. P.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Metals and Alloys,Mechanics of Materials,Condensed Matter Physics

Link

https://link.springer.com/content/pdf/10.1007/BF02668017.pdf

Reference23 articles.

1. M. M. P. Janssen and G. D. Rieck,Trans. TMS-AIME, 1967, vol. 239, pp. 1372–85; M. M. P. Janssen: Thesis University of Technology, Eindhoven, Netherlands, 1966.

2. G. W. Goward, D. H. Boone, and C. S. Giggins:ASM Trans. Quart., 1967, vol. 60, pp. 228–41.

3. T. K. Redden:Trans. TMS-AIME, 1968, vol. 242, pp. 1695–1702.

4. J. R. Eifert, D. A. Chatfield, G. W. Powell, and J. W. Spretnak:Trans. TMS-AIME, 1968, vol. 242, pp. 66–71.

5. G. W. Powell and R. Schuhmann:Trans. TMS-AIME, 1969, vol. 245, pp. 961–65.

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