1. J.A. Thornton and J.E. Greene, “Plasmas used in deposition processes” in Deposition Technologies for Films and Coatings ed. R.F. Bunshah, Noyes Publ. New York, (1990) ch 2.
2. B. Chapman, Glow Discharge Processes, John Wiley & Sons, New York, (1980).
3. see for example, E. W. McDaniel, Collision Phenomena in Ionized Gases, Wiley, New York, (1964).
4. W.D. Westwood, “Calculations of deposition rates in diode sputtering systems”,J. Vac. Sci. Technol. 15, 1, (1978).
5. R. S. Robinson, “Energetic binary collisions in rare gas plasmas”, J. Vac. Sci. Technol. 16, 185, (1979).