Contact and Interconnect Technology
Reference135 articles.
1. Semiconductor Industry Association, Technology Roadmap defined during the Semiconductor Technology Workshop, 1993.
2. R. M. Geffken, J. G. Ryan and G. J. Slusser, “Contact Metallurgy Development for VLSI Logic,” IBM J. Res. Dev., 31(6), 608 (1987).
3. M. Hansen and A. Anderko, Constitution of Binary Alloys, McGraw Hill (1958).
4. J. O. McCaldin and H. Sankur, “Diffusivity and Solubility of Silicon in the Al Metallization of Integrated Circuits,” Appl. Phys. Lett., 19, 524 (1971).
5. B. L. Crowder and S. Zirinski, “One Micron MOSFET VLSI Technology: Part VII-Metal Silicide Interconnection Technology-A Future Perspective,” IEEE Trans. Electron Dev., ED-26, 369 (1979).