Author:
Tsai H. Y.,Hocheng H.,Huang Y. L.
Reference67 articles.
1. Preston FW (1927) J Soc Glass Tech 11:214
2. Hocheng H, Huang YL (2007) Trans Semiconductor Manufact 20(3):306
3. Warnock J (1991) J Electrochem Soc 138(8):2398
4. Yu TK, Yu CC, Orlowski M(1993) A statistical polishing pad model for chemical mechanical polish, IEDM Technical Digest, p. 865
5. Cook LM (1990) J Non-Cryst Solids 120:152
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献