Determination of the Thickness OF SiO2-Layers on Si by X-Ray Analysis and by X-Ray Photoelectron Spectroscopy
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Publisher
Springer US
Link
http://link.springer.com/content/pdf/10.1007/978-1-4613-3096-7_29.pdf
Reference4 articles.
1. C. S. Fadley, “Solid State- and Surface-Analysis by Means of Angular-Dependent X-Ray Photoelectron Spectroscopy,” Progress in Solid State Chemistry 11: 265–343 (1976).
2. M. F. Ebel, “Zur Bestimmung der reduzierten Dicke D/λ dünner Schichten mittels XPS,” J. Electron Spectrosc. Relat. Phenom. 14: 287–322 (1978).
3. M. F. Ebel and W. Liebl, “Evaluation of XPS-Data of Oxide Layers,” J. Electron Spectrosc. Relat. Phenom. 16: 463–470 (1979).
4. D. R. Penn, “Quantitative Chemical Analysis by ESCA,” J. Electron Spectrosc. Relat. Phenom. 9: 29–40 (1976).
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