Mechanism of Lithography-Reference-Cited by-同舟云学术

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Mechanism of Lithography

Published:1975 Issue: Volume: Page:725-734
ISSN:
Container-title:Adhesion Science and Technology
language:
Short-container-title:

Author:

Wilkinson M. C.,Aronson M. P.,Vanderhoff J. W.,Zettlemoyer A. C.

Publisher

Springer US

Link

http://link.springer.com/content/pdf/10.1007/978-1-4613-4331-8_20.pdf

Reference4 articles.

1. E. J. Clayfield, D. J. Dear, J. B. Mathews, and T. V. Withen, Proc. 2nd Int. Congr. Surface Activity, London 3, 165 (1957).

2. J.A. Lavelle, Ph,D. Thesis, Lehigh University (1968).

3. J.W. Vanderhoff, Am. Ink Maker 51(3), 25 (1973).

4. M. C. Willinson, M. P. Aronson, J. W. Vanderhoff and A. C. Zettlemoyer, in preparation.

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Forced wetting and dewetting of liquids on solid surfaces and their roles in offset printing;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2008-03

2. A new understanding on the mechanism of fountain solution in the prevention of ink transfer to the non-image area in conventional offset lithography;Journal of Adhesion Science and Technology;2004-01

3. The transfer and setting of ink on coated paper;Progress in Organic Coatings;1991-11

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