Structural properties of amorphous carbon thin films deposited by LF (100 kHz), RF (13.56 MHz), and pulsed RF (13.56 MHz) plasma CVD
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Chemical Engineering,General Chemistry
Link
http://link.springer.com/content/pdf/10.1007/BF02706657.pdf
Reference16 articles.
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4. Fedosenko, G., Schwabedissen, A., Engemann, J., Braca, E., Valentini, L. and Kenny, J. M.,“Pulsed PECVD Deposition of Diamond-like Carbon Films,”Diamond and Related Materials,11, 1047(2002).
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